Experimental and theoretical study of the evolution of surface roughness in amorphous silicon films grown by low-temperature plasma-enhanced chemical vapor deposition Article (Web of Science)

cited authors

  • Kryukov, Y. A.; Podraza, N. J.; Collins, R. W.; Amar, J. G.

publication date

  • August 1, 2009

webpage

published in

author keyword

  • amorphous semiconductors
  • elemental semiconductors
  • hydrogen
  • nucleation
  • plasma CVD
  • semiconductor growth
  • semiconductor thin films
  • silicon
  • surface diffusion
  • surface roughness
  • surface tension
  • wetting

category

volume

  • 80

issue

  • 8