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Damage to Si substrates during SiO2 etching: A comparison of reactive ion etching and magnetron-enhanced reactive ion etching
Article (Web of Science)
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authors
Gu, Tieer
publication date
1994
webpage
http://dx.doi.org/10.1116/1.587391
published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Journal
Additional Document Info
start page
567
volume
12
issue
2