Low temperature plasma process based on CO-rich CO/H2 mixtures for high rate diamond film deposition Article (Web of Science)

authors

  • Lee, Joungchel
  • Messier, R.
  • Strausser, Y. E.

publication date

  • 1997

webpage

published in

number of pages

  • 2

start page

  • 1527

end page

  • 1529

volume

  • 70

issue

  • 12