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The growth of thin oxides on a‐Si and a‐Si:H in an O2 plasma
Article (Web of Science)
Overview
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authors
Tuckerman, C. J.
Huang, C.‐Y.
Windischmann, H.
publication date
1985
webpage
http://dx.doi.org/10.1116/1.572927
published in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Journal
Additional Document Info
number of pages
4
start page
2077
end page
2081
volume
3
issue
6