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The effects of the pressure and the oxygen content of the sputtering gas on the structure and the properties of zinc oxy-nitride thin films deposited by reactive sputtering of zinc
Article (Faculty180)
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cited authors
Jiang, Nanke; Georgiev, Daniel G.; Jayatissa, Ahalapitiya H.
authors
Georgiev, Daniel G
publication date
2013
published in
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Journal
Additional Document Info
volume
28