The effects of the pressure and the oxygen content of the sputtering gas on the structure and the properties of zinc oxy-nitride thin films deposited by reactive sputtering of zinc Article (Faculty180)

cited authors

  • Jiang, Nanke; Georgiev, Daniel G; Jayatissa, Ahalapitiya H

publication date

  • 2013

published in

start page

  • 025009


  • 28