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The effects of the pressure and the oxygen content of the sputtering gas on the structure and the properties of zinc oxy-nitride thin films deposited by reactive sputtering of zinc
Article (Faculty180)
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cited authors
Jiang, Nanke; Georgiev, Daniel G; Jayatissa, Ahalapitiya H
authors
Jayatissa, Ahalapitiya H
publication date
2013
published in
Semiconductor Science and Technology
Journal
Additional Document Info
start page
025009
volume
28