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Low-temperature growth of microcrystalline silicon using 100% by rf glow discharge method
Article (Web of Science)
Overview
Additional Document Info
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authors
Jayatissa, Ahalapitiya H
Hatanaka, Yoshinori
Nakanishi, Yoichiro
Ishikawa, Kenji
publication date
1996
webpage
http://dx.doi.org/10.1088/0022-3727/29/6/033
published in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Journal
Additional Document Info
number of pages
4
start page
1636
end page
1640
volume
29
issue
6