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RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition
Proceedings Paper (Web of Science)
Overview
Overview
authors
Hirano, Yoshiyuki
Sato, Fumio
Jayatissa, Ahalapitiya H
Ohtake, Hiroshi
Takizawa, Kuniharu
publication date
1998
webpage
http://dx.doi.org/10.1117/12.304500
published in
NANOMATERIALS SYNTHESIS, INTERFACING, AND INTEGRATING IN DEVICES, CIRCUITS, AND SYSTEMS II
Book