Copper tantalum nitride (CuTaN ) thin films prepared by reactive radio-frequency magnetron sputtering

Article (Web of Science)

• cited authors: Islam, Md Maidul; Ranga, Abhishek Goud; Borra, Vamsi; Georgiev, Daniel G.
• publication date: June 1, 2024
• webpage: Web of Science
• published in: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING Journal
• category: PHYSICS, APPLIED Category

keywords

• Band gap
• Copper tantalum nitride
• RF reactive sputtering
• Raman spectroscopy
• Resistivity measurements
• Scanning electron microscopy
• Thin films
• X-ray diffraction

• volume: 130
• issue: 6