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Experimental and theoretical study of the evolution of surface roughness in amorphous silicon films grown by low-temperature plasma-enhanced chemical vapor deposition
Article (Faculty180)
Overview
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cited authors
Kryukov, Y A; Podraza, N J; Collins, R W; Amar, J G
publication date
2009
published in
Physical Review B
Journal
Additional Document Info
start page
085403
volume
80